Related references
Note: Only part of the references are listed.Composition dependent nanocolumn tilting angle during the oblique angle co-deposition
Yiping Zhao et al.
APPLIED PHYSICS LETTERS (2012)
Texture and microstructure in co-sputtered Mg-M-O (M = Mg, Al, Cr, Ti, Zr, and Y) films
M. Saraiva et al.
JOURNAL OF APPLIED PHYSICS (2012)
An introduction to thin film processing using high-power impulse magnetron sputtering
Daniel Lundin et al.
JOURNAL OF MATERIALS RESEARCH (2012)
High power impulse magnetron sputtering discharge
J. T. Gudmundsson et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2012)
Discharge physics of high power impulse magnetron sputtering
Andre Anders
SURFACE & COATINGS TECHNOLOGY (2011)
Mitigating the geometrical limitations of conventional sputtering by controlling the ion-to-neutral ratio during high power pulsed magnetron sputtering
G. Greczynski et al.
THIN SOLID FILMS (2011)
Tilt angle control of nanocolumns grown by glancing angle sputtering at variable argon pressures
J. M. Garcia-Martin et al.
APPLIED PHYSICS LETTERS (2010)
High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
K. Sarakinos et al.
SURFACE & COATINGS TECHNOLOGY (2010)
High power pulsed magnetron sputtering: Fundamentals and applications
J. Alami et al.
JOURNAL OF ALLOYS AND COMPOUNDS (2009)
On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering
J. Alami et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2009)
Antireflection Coatings with Helical SiO2 Films Prepared by Using Glancing Angle Deposition
Yong Jun Park et al.
JOURNAL OF THE KOREAN PHYSICAL SOCIETY (2009)
Fabrication of 2D-3D photonic crystal heterostructures by glancing angle deposition
M. A. Summers et al.
PHOTONICS AND NANOSTRUCTURES-FUNDAMENTALS AND APPLICATIONS (2009)
Electron energy distributions and plasma parameters in high-power pulsed magnetron sputtering discharges
A. D. Pajdarova et al.
PLASMA SOURCES SCIENCE & TECHNOLOGY (2009)
Origins of ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) plasma discharge
A. Hecimovic et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2008)
Ion energy distributions and efficiency of sputtering process in HIPIMS system
K. Burcalova et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2008)
The metal flux from a rotating cylindrical magnetron: a Monte Carlo simulation
K. Van Aeken et al.
JOURNAL OF PHYSICS D-APPLIED PHYSICS (2008)
Multi-component nanostructure design by atomic shadowing
C. M. Zhou et al.
THIN SOLID FILMS (2008)
The physical reason for the apparently low deposition rate during high-power pulsed magnetron sputtering
Jens Emmerlich et al.
VACUUM (2008)
Nanostructure engineering in porous columnar thin films: recent advances
John J. Steele et al.
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS (2007)
Glancing angle deposition: Fabrication, properties, and applications of micro- and nanostructured thin films
Matthew M. Hawkeye et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2007)
On the deposition rate in a high power pulsed magnetron sputtering discharge
J. Alami et al.
APPLIED PHYSICS LETTERS (2006)
Ionized physical vapor deposition (IPVD): A review of technology and applications
Ulf Helmersson et al.
THIN SOLID FILMS (2006)
The ultrasmoothness of diamond-like carbon surfaces
M Moseler et al.
SCIENCE (2005)
Incidence angle dependences of columnar grain structure and texture in obliquely deposited iron films
K Okamoto et al.
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS (2005)
Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces
J Alami et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2005)
Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique
AP Ehiasarian et al.
THIN SOLID FILMS (2004)
Microstructural evolution during film growth
I Petrov et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (2003)
Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge
JT Gudmundsson et al.
SURFACE & COATINGS TECHNOLOGY (2002)
Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge
JT Gudmundsson et al.
APPLIED PHYSICS LETTERS (2001)
In situ physical vapor deposition of ionized Ti and TiN thin films using hollow cathode magnetron plasma source
GC D'Couto et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B (2001)
Ionized physical-vapor deposition using a hollow-cathode magnetron source for advanced metallization
E Klawuhn et al.
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS (2000)
Share Paper
