4.6 Article

Field evaporation mechanism of bulk oxides under ultra fast laser illumination

Journal

JOURNAL OF APPLIED PHYSICS
Volume 110, Issue 4, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.3610523

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Funding

  1. ESP Carnot
  2. Region Haute-Normandie
  3. ANR (TAPAS)

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The controlled field evaporation of single atoms from an oxide surface assisted by ultra fast laser pulses has recently been demonstrated. When UV light is used, a photoionization mechanism was proposed. However, experimental results observed when the laser intensity and wavelength are changed cannot be explained by this mechanism. Instead, a thermal assisted evaporation mechanism characterized by two evaporation times is proposed. The fast and slow evaporation rates are associated to two cooling processes inside the tip sample. Experiments are carried out on TiO2 and MgO field emitter tips to check the dependence of the evaporation process on structural properties of the oxide. A good agreement between the predictions of our model and the experimental data is found. (C) 2011 American Institute of Physics. [doi:10.1063/1.3610523]

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