Journal
JOURNAL OF APPLIED PHYSICS
Volume 107, Issue 11, Pages -Publisher
AMER INST PHYSICS
DOI: 10.1063/1.3431351
Keywords
atomic layer deposition; electron beam deposition; nanofabrication; nanopatterning; nanostructured materials; platinum
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An approach for direct-write fabrication of high-purity platinum nanostructures has been developed by combining nanoscale lateral patterning by electron beam induced deposition (EBID) with area-selective deposition of high quality material by atomic layer deposition (ALD). Because virtually pure, polycrystalline Pt nanostructures are obtained, the method extends the application possibilities of EBID, whereas compared to other area-selective ALD approaches, a much higher resolution is attainable; potentially down to sub-10 nm lateral dimensions. (c) 2010 American Institute of Physics. [doi:10.1063/1.3431351]
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