4.6 Article

Effect of local surface potential distribution on its relaxation in polycrystalline ferroelectric films

Journal

JOURNAL OF APPLIED PHYSICS
Volume 107, Issue 5, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.3290953

Keywords

-

Funding

  1. Samsung Electronics
  2. Korean government (MEST) [2009-0052806]
  3. UChicago Argonne, LLC, Operator of Argonne National Laboratory (Argonne). Argonne, a U.S. DOE Office of Science Laboratory [DE-AC02-06CH11357]

Ask authors/readers for more resources

We have studied the effect of local surface potential distribution on its relaxation in the polycrystalline ferroelectric thin films. A lower surface potential region, i.e., potential pit, is generated near a grain boundary. The deep potential pit has a faster relaxation than the area far away from the potential pit due to the acceleration of the screen charge draining near the grain boundary and the domains formed by applying higher voltage have a faster relaxation due to the larger gradient of screen charge distribution. In addition, the surface potential and its relaxation depend on the sign of applying voltage. The result shows that the surface potential distribution may influence significantly to the reliability of bit signal on the memory devices. (C) 2010 American Institute of Physics. [doi:10.1063/1.3290953]

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.6
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available