4.6 Article

On the electron energy in the high power impulse magnetron sputtering discharge

Journal

JOURNAL OF APPLIED PHYSICS
Volume 105, Issue 12, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.3151953

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The temporal variation of the electron energy distribution function (EEDF) was measured with a Langmuir probe in a high power impulse magnetron sputtering (HiPIMS) discharge at 3 and 20 mTorr pressures. In the HiPIMS discharge a high power pulse is applied to a planar magnetron giving a high electron density and highly ionized sputtered vapor. The measured EEDF is Maxwellian-like during the pulse; it is broader for lower discharge pressure and it becomes narrower as the pulse progresses. This indicates that the plasma cools as the pulse progresses, probably due to high metal content of the discharge. (C) 2009 American Institute of Physics. [DOI: 10.1063/1.3151953]

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