4.6 Article

Resonance effects in thickness-dependent ultrafast carrier and phonon dynamics of topological insulator Bi2Se3

Journal

NANOTECHNOLOGY
Volume 27, Issue 4, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.1088/0957-4484/27/4/045705

Keywords

topological insulator; Bi2Se3; pump-probe; differential reflectivity; resonance

Funding

  1. National Research Foundation of Korea (NRF) grant - Ministry of Science, ICT & Future Planning [2011-0017373]
  2. Gordon and Betty Moore Foundation's EPiQS Initiative [GBMF4418]
  3. National Research Foundation of Korea (NRF) grant - Korean government [2013R1A2A2A01067707]
  4. National Research Foundation of Korea [2011-0017373, 22A20130000025, 2013R1A2A2A01067707] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)

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Resonance effects in the thickness-dependent ultrafast carrier and phonon dynamics of topological insulator Bi2Se3 are found irrespective of the kind of substrate by measuring thickness-dependent abrupt changes of pump-probe differential-reflectivity signals (Delta R/R) from Bi2Se3 thin films on four different substrates of poly-and single-crystalline (sc-) ZnO, sc-GaN and SiO2. The absolute peak intensity of the Delta R/R is maximized at similar to t(C) (6 similar to 9 quintuple layers), which is not directly related to but is very close to the critical thickness below which the energy gap opens. The intensities of the two phonon modes deduced from the oscillatory behaviors superimposed on the Delta R/R profiles are also peaked at similar to t(C) for the four kinds of substrates, consistent with the thickness-dependent Raman-scattering behaviors. These resonant effects and others are discussed based on possible physical mechanisms including the effects of three-dimensional carrier depletion and intersurface coupling.

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