Journal
JOURNAL OF ALLOYS AND COMPOUNDS
Volume 602, Issue -, Pages 331-338Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2014.03.021
Keywords
In situ Cu-Nb microcomposite; Hall-Petch; Interface area density; Solid solution hardening
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Funding
- National Natural Science Foundation of China [51031002, 51201188]
- US NSF [DMR-0084173]
- US DOE
- State of Florida
- National Natural Science Foundation of China for Non-metals [51261130091]
- Danish National Research Foundation
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This paper reports our investigation on the evolution of microstructure, hardness, and electrical conductivity of in situ Cu-16.5 vol.% Nb microcomposites as a function of drawing strain. Both interface area density and lattice distortion were taken into account for analyzing the hardness and resistivity at different levels of plastic strain. A model was developed for describing microstructure dimensions including both spacing and curl of Nb ribbons. Based on this model, a modified Hall-Petch formula was derived. Our results suggest that interface area density and lattice distortion have significant impacts on both hardness and electrical resistivity. (C) 2014 Elsevier B. V. All rights reserved.
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