Journal
JOURNAL OF ALLOYS AND COMPOUNDS
Volume 579, Issue -, Pages 160-164Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2013.04.192
Keywords
NiZnO; Electrical characteristics; MOCVD
Categories
Funding
- National Natural Science Foundation of China [61006006, 60877020, 60976010]
- 973'' program [2011CB30200001]
- science and technology development project in Jilin province [20100170]
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NiZnO thin films with different Ni and O contents were grown by photo-assist metal-organic chemical vapor deposition. Electrical characteristics of films including resistances and charge carrier concentrations were analyzed. The intrinsic donor defects in NiZnO films could be effectively compensated by the increasing the Ni and O contents. A p-type NiZnO film with a high hole concentration could be obtained by controlling the Ni and O content of the film. This was further confirmed by analyzing defect levels from photoluminescence measurements. (C) 2013 Elsevier B.V. All rights reserved.
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