Journal
JOURNAL OF ALLOYS AND COMPOUNDS
Volume 509, Issue 5, Pages 2414-2419Publisher
ELSEVIER SCIENCE SA
DOI: 10.1016/j.jallcom.2010.11.032
Keywords
ZnSe thin films; Optical band gap; Annealing effect; Semiconductor; Refractive index
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Thin films of ZnSe were deposited on soda lime glass substrates by thermal evaporation and annealed in vacuum at various temperatures in the range of 100-300 degrees C. Structural and optoelectronic properties of these films were investigated and compared with the available data. XRD studies revealed that as-deposited films were polycrystalline in nature with cubic structure. It was further observed that the grain size and crystallinity increased, whereas dislocations and strains decreased with the increase of annealing temperature. The optical energy band gap estimated from the transmittance data was in the range of 2.60-2.67 eV. The observed increase in band gap energy with annealing temperature may be due to the quantum confinement effects. Similarly, refractive index of the films was found to increase with the annealing temperature. The AFM images revealed that films were uniform and pinhole free. The RMS roughness of the films increased from 1.5 nm to 2.5 nm with the increase of annealing temperature. Resistivity of the films decreased linearly with the increase of temperature. (C) 2010 Elsevier B.V. All rights reserved.
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