Journal
NANO LETTERS
Volume 15, Issue 11, Pages 7388-7393Publisher
AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.5b02802
Keywords
Metamaterial; dielectric antenna; Fano resonance; third harmonic generation
Categories
Funding
- National Science Foundation [ECCS-1351334]
- Office of Naval Research [N00014-14-1-0475]
- Div Of Electrical, Commun & Cyber Sys
- Directorate For Engineering [1351334] Funding Source: National Science Foundation
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Strong nonlinear light-matter interaction is highly sought-after for a variety of applications including lasing and all-optical light modulation. Recently, resonant plasmonic structures have been considered promising candidates for enhancing nonlinear optical processes due to their ability to greatly enhance the optical near-field; however, their small mode volumes prevent the inherently large nonlinear susceptibility of the metal from being efficiently exploited. Here, we present an alternative approach that utilizes a Fano-resonant silicon metasurface. The metasurface results in strong near-field enhancement within the volume of the silicon resonator while minimizing two photon absorption. We measure a third harmonic generation enhancement factor of 1.5 x 10(5) with respect to an unpattemed silicon film and an absolute conversion efficiency of 1.2 x 10(-6) with a peak pump intensity of 3.2 GW cm(-2). The enhanced nonlinearity, combined with a sharp linear transmittance spectrum, results in transmission modulation with a modulation depth of 36%. The modulation mechanism is studied by pump-probe experiments.
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