4.8 Article

Surface Recombination Limited Lifetimes of Photoexcited Carriers in Few-Layer Transition Metal Dichalcogenide MoS2

Journal

NANO LETTERS
Volume 15, Issue 12, Pages 8204-8210

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.5b03708

Keywords

2D Materials; ultrafast dynamics; carrier recombination; quantum well; Auger scattering swface recombination

Funding

  1. CCMR under NSF [DMR-1120296]
  2. AFOSR-MURI [FA9550-09-1-0705]
  3. ONR [N00014-12-1-0072]
  4. Cornell Center for Nanoscale Systems - NSF

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We present results on photoexcited carrier lifetimes in few-layer transition metal dichalcogenide MoS, using nondegenerate ultrafast optical pump-probe technique. Our results show a sharp increase of the carrier lifetimes with the number of layers in the sample. Carrier lifetimes increase from few tens of picoseconds in monolayer samples to more than a nanosecond in 10-layer samples. The inverse carrier lifetime was found to scale according to the probability of the carriers being present at the surface layers, as given by the carrier wave function in few layer samples, which can be treated as quantum wells. The carrier lifetimes were found to be largely independent of the temperature, and the inverse carrier lifetimes scaled linearly with the photo excited carrier density. These observations are consistent with defect-assisted carrier recombination, in which the capture of electrons and holes by defects occurs via Auger scatterings. Our results suggest that carrier lifetimes in few-layer samples are surface recombination limited due to the much larger defect densities at surface layers compared with the inner layers.

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