4.8 Article

Self-Equilibration of the Diameter of Ga-Catalyzed GaAs Nanowires

Journal

NANO LETTERS
Volume 15, Issue 8, Pages 5580-5584

Publisher

AMER CHEMICAL SOC
DOI: 10.1021/acs.nanolett.5b02226

Keywords

III-V nanowires; silicon integration; self-catalyzed growth; growth kinetics; size distribution; focusing effect

Funding

  1. European Community [PITN-GA-2012-316751]
  2. EQUIPEX program Excelsior
  3. RENATECH network
  4. Region Nord-Pas-de-Calais
  5. National Natural Science Foundation of China [61204014]
  6. Russian Science Foundation [14-22-00018]
  7. Russian Science Foundation [14-22-00018] Funding Source: Russian Science Foundation

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Designing strategies to reach monodispersity in fabrication of semiconductor nanowire ensembles is essential for numerous applications. When Ga-catalyzed GaAs nanowire arrays are grown by molecular beam epitaxy with help of droplet-engineering, we observe a significant narrowing of the diameter distribution of the final nanowire array with respect to the size distribution of the initial Ga droplets. Considering that the droplet serves as a nonequilibrium reservoir of a group III metal, we develop a model that demonstrates a self-equilibration effect on the droplet size in self-catalyzed III V nanowires. This effect leads to arrays of nanowires with a high degree of uniformity regardless of the initial conditions, while the stationary diameter can be further finely tuned by varying the spacing of the array pitch on patterned Si substrates.

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