Journal
JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY
Volume 22, Issue 15, Pages 1931-1948Publisher
TAYLOR & FRANCIS LTD
DOI: 10.1163/156856108X320078
Keywords
Dynamic contact angle; wetting; nano-patterned surfaces; photoresist
Funding
- International SEMATECH
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In efforts to increase the scanning speeds of the current state-of-the-art IC chip manufacturing process, immersion lithography, the present work investigates the liquid wetting effects of oriented surface nanopatterns with varying depth. In this set of experiments, both static and forced dynamic contact line behaviors of two liquids were studied on two substrate materials imprinted with line-space nanopatterns of varying depth and hybridization (second tier of nano-posts). These experiments found a variety hydrophobic and hydrophilic behaviors, some of which deviate from conventional wetting theories. Specifically, the static and dynamic liquid contact angles are found to consistently depend on the depth of patterns with the same interfacial areas, and a surface with contact angle less than 90 degrees was turned highly hydrophobic with the addition of patterns. (c) Koninklijke Brill NV, Leiden, 2008
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