4.3 Article

Shottky Barrier Diodes on AlN Free-Standing Substrates

Journal

JAPANESE JOURNAL OF APPLIED PHYSICS
Volume 51, Issue 4, Pages -

Publisher

IOP PUBLISHING LTD
DOI: 10.1143/JJAP.51.040206

Keywords

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Funding

  1. Ministry of Education, Culture, Sports, Science and Technology, Japan (MEXT)
  2. Grants-in-Aid for Scientific Research [23560380] Funding Source: KAKEN

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Lateral Schottky rectifiers were fabricated on bulk single-crystal free-standing AlN substrates. The unintentionally doped substrates display n-type conductivity. The diode shows a low reverse leakage current of similar to 0.1 nA at -40 V at room temperature. The ideality factor for forward characteristics is 11.7 at room temperature and shows temperature dependence, suggesting the lateral nonuniformities at the metal/semiconductor interface. The fabricated devices are stably operated even at 573 K, owing to the wide band gap (6.2 eV) of AlN. The reverse leakage current of the device is explained by either a trap-assisted tunneling process or one-dimensional variable-range-hopping conduction along the dislocations. (C) 2012 The Japan Society of Applied Physics

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