Langmuir-Blodgett fabrication of nanosheet-based dielectric films without an interfacial dead layer

Langmuir-Blodgett (LB) deposition was employed to fabricate high-kappa dielectric nanofilms of titania nanosheets. The LB-based layer-by-layer approach using an atomically flat SrRuO(3) substrate is effective for the fabrication of atomically uniform and highly dense nanofilms. These films exhibited both high dielectric constant (kappa similar to 123) and low leakage current density (J < 10(-7) A cm(-2)) for thicknesses down to 5 nm, while eliminating the size-effect problems encountered in current high-kappa From analyses of interfacial structures by transmission electron microscopy and hard X-ray photoelectron spectroscopy. we have clarified that the films are composed of a well-ordered lamellar structure without an interfacial dead layer. According to first-principles calculations, a highly polarizable nature of titania nanosheets can bring improved dielectric properties. yielding high-kappa values even in an ultrathin geometry.