Journal
INTERNATIONAL MATERIALS REVIEWS
Volume 58, Issue 2, Pages 113-129Publisher
TAYLOR & FRANCIS LTD
DOI: 10.1179/1743280412Y.0000000009
Keywords
Surface modification; Metal surface treatment; Ceramic structure
Categories
Funding
- US Department of Energy [DE-AC09-08SR22470]
- Directorate For Engineering
- Div Of Chem, Bioeng, Env, & Transp Sys [1136330] Funding Source: National Science Foundation
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Atomic layer deposition (ALD) is being used for deposition of conformal thin films on a variety of materials, including medical device materials and biologically derived materials. This review describes thin film deposition on materials using ALD for bioelectronic device, implantable device, biosensor, drug delivery device, tissue engineering scaffold and bioassay device applications. Recent advances in ALD technology, including low temperature ALD of thin films on temperature sensitive substrates, are considered. Finally, translation of ALD to commercial use, including use of ALD by the medical device industry, is described.
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