Three-dimensional Microstructure Using Partitioned Cross-sections in Projection Microstereolithography

Microstereolithography (mu SL) is similar to the conventional stereolithography process and allows the fabrication of complex microstructures with high aspect ratios. In the projection mu SL process, each layer is fabricated by one irradiation of the light which has a cross-sectional shape. At this time, the fabrication range is limited by the field of view of pattern generator (LCD or DMD) and the magnification of the objective lens. In this study, we propose a partitioned cross-section method for expanding the fabrication range while maintaining the fabrication resolution in the projection mu SL system. A cross-section is partitioned into several sub-sections, having required size in the pattern generator. Then, the shaped light corresponding to sub-section is irradiated at specific position on the resin surface, and cured sub-sections make completed cross-section. The procedure for generating a series of sub-sections has been presented. Using this method, some microstructures have been fabricated.