Dissociative electron attachment and dissociative ionization of 1,1-dichloro-1-silacyclohexane and silacyclohexane

Here we present a study on dissociative electron attachment (DEA) and dissociative ionization (DI) of 1,1-dichloro-1-silacyclohexane and silacyclohexane, and we discuss the results in relation to the role of secondary electrons in focused electron beam induced deposition (FEBID). In both 1,1-dichloro-1-silacyclohexane and silacyclohexane DI leads to extensive fragmentation that is governed by carbon and hydrogen loss. In 1,1-dichloro-1-silacyclohexane DEA also leads to a wide-range of fragments, but with the exception of the Cl- formation and the formation of C5H6Si-, most channels appear with low efficiency. Different from 1,1-dichloro-1-silacyclohexane, no fragment formation is observed in DEA to silacyclohexane. This compound might thus be suitable to distinguish between DEA and DI through secondary electrons in FEBID. (C) 2014 Elsevier B.V. All rights reserved.