Journal
MICROELECTRONIC ENGINEERING
Volume 139, Issue -, Pages 13-18Publisher
ELSEVIER
DOI: 10.1016/j.mee.2015.04.084
Keywords
Nano-star; Electron beam lithography; Exposure dose; Optical properties
Categories
Funding
- University of Queensland [FT10942050]
- University of Technology Sydney [ARC DP120102545]
- Australian Research Council
- CSIRO OCE Science Leadership Program
- ARC Linkage project [LP0560475]
- Australian Research Council [LP0560475] Funding Source: Australian Research Council
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Lithography techniques play an important role in the fabrication of nanoscale functional devices. In electron beam lithography (EBL) the optimum dose of electron irradiation is a critical parameter. In this paper, we first identify suitable EBL fabrication parameters by writing patterns with different sizes, periods and electron radiation doses. After finding suitable fabrication parameters, we show how five-pointed gold nanostructures with electric field-enhancing 'top hats' can be fabricated using EBL. Reflectance data of these arrays is measured in order to assess their potential applications in biosensing arrays. (C) 2015 Elsevier B.V. All rights reserved.
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