Journal
MICRO & NANO LETTERS
Volume 10, Issue 7, Pages 334-338Publisher
WILEY
DOI: 10.1049/mnl.2014.0267
Keywords
nanowires; nanofabrication; etching; ion beam effects; ion-beam-assisted fabrication; metallic nanowires; chemical etching; ion beam milling; shape modihcation; ion beam irradiation; bending effect; ion beam-assisted shape manoeuvre; metallic structures; ion-induced vacancy formation; damaged layer reconfiguration; strain formation process; nanoscale metals
Funding
- NSTI
- Department of Science and Technology, India
- IIT Kanpur
- EPSRC, UK [EP/K018345/1]
- EPSRC [EP/K018345/1] Funding Source: UKRI
- Engineering and Physical Sciences Research Council [EP/K018345/1] Funding Source: researchfish
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Metallic nanowires (NWs) are the key performers for future micro/nanodevices. The controlled manoeuvring and integration of such nanoscale entities are essential requirements. Presented is a discussion of a fabrication approach that combines chemical etching and ion beam milling to fabricate metallic NWs. The shape modification of the metallic NWs using ion beam irradiation (bending towards the ion beam side) is investigated. The bending effect of the NWs is observed to be instantaneous and permanent. The ion beam-assisted shape manoeuvre of the metallic structures is studied in the light of ion-induced vacancy formation and reconfiguration of the damaged layers. The manipulation method can be used for fabricating structures of desired shapes and aligning structures at a large scale. The controlled bending method of the metallic NWs also provides an understanding of the strain formation process in nanoscale metals.
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