Journal
IEEE TRANSACTIONS ON PLASMA SCIENCE
Volume 38, Issue 11, Pages 3089-3094Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TPS.2010.2073688
Keywords
Aluminum nitride; high-power impulse magnetron sputtering (HiPIMS); mass spectrometry
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Funding
- Agence Nationale de la Recherche
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In this paper, mass spectrometry was used to measure the ion energy distributions of the main species during the sputtering of an aluminum target in a reactive Ar + N(2) mixture. Both conventional magnetron sputtering (dc) and high-power impulse magnetron sputtering (HiPIMS) were used. It appears that, in the HiPIMS, N(+) and Al(+) ions are significantly more energetic (up to 70 eV) than in the dc (< 40 eV). Furthermore, the HiPIMS Al(+) signal is two orders of magnitude greater than in the dc, and time-resolved measurements indicate that most of the ion flux hits the substrate during the OFF time of the impulse sequence.
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