Journal
IEEE TRANSACTIONS ON MAGNETICS
Volume 45, Issue 10, Pages 4008-4010Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TMAG.2009.2024161
Keywords
Multilayered media; thin films
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The magnetic properties of Si/Ru(t nm)/Fe90Co10 (3.0 nm)/Ru (4.0 nm) films with obliquely sputtered Ru underlayers were studied as a function of Ru underlayer thickness (t). It was found that an obliquely sputtered Ru underlayer produces high uniaxial anisotropy in the Fe90Co10 layer with extremely small hysteresis in the hard axis direction. The anisotropy field can be increased by increasing Ru underlayer thickness. X-ray reflectometry showed that the interfaces of the samples were quite smooth with rms roughness as small as 0.35 nm. The high uniaxial anisotropy of the samples shows high thermal stability and endures e-beam lithography for microscopic device fabrication. We discuss the origin of this high anisotropy in terms of a magnetostatic effect arising from an anisotropic surface morphology.
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