4.4 Article

Characterization of an AlOx Tunneling Barrier in a Magnetic Tunnel Junction by a Surface Plasmon Resonance Spectroscopy Technique

Journal

IEEE TRANSACTIONS ON MAGNETICS
Volume 45, Issue 1, Pages 60-63

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TMAG.2008.2006570

Keywords

Magnetic random access memory; magnetoresistance; temperature measurement; tunneling

Funding

  1. Korean Government (MOEHRD) [KRF-2007-313-C00243]

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We measured tunneling magnetoresistance (TMR) in a magnetic tunnel junction as a function of temperature. We used surface plasmon resonance spectroscopy (SPRS) one of the most useful tools in the analysis of dielectric function in a thin tunneling barrier-to study the correlation of AlOx barrier quality with the temperature dependent behavior of the TMR ratio. The experimental SPRS analysis suggests that the decrease of the TMR ratio starting at 150 K is caused by residual Al metallic defects distributed within the insulating AlOx barrier. We checked this result by measuring the junction resistances in parallel and antiparallel states.

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