4.6 Article

Reliability Impact of Chalcogenide-Structure Relaxation in Phase-Change Memory (PCM) Cells-Part II: Physics-Based Modeling

Journal

IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume 56, Issue 5, Pages 1078-1085

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TED.2009.2016398

Keywords

Amorphous semiconductors; chalcogenide materials; nonvolatile memory; phase-change memory (PCM); reliability estimation; reliability modeling

Funding

  1. EU [IST-3-017406]
  2. Italian Minister for University and Research [PRIN2005092299, FIRB-RBIP06YSJJ]
  3. Cariplo Foundation [2005-124]

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Phase-change memory (PCM) cells are affected by structural relaxation (SR), which is the atomic-scale rearrangement of the amorphous phase of the chalcogenide material. Since SR affects the stability of electrical parameters of the PCM cell, such as resistance and threshold voltage, physics-based models for SR are necessary to analyze and predict the device reliability. This paper presents a physical model for SR in amorphous chalcogenide materials, linking the defect annihilation dynamics to the conduction behavior of the cell, hence to the electrical characteristics of the PCM cell. The model is able to predict the PCM cell characteristics as a function of annealing time, temperature, and read conditions.

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