Journal
IEEE TRANSACTIONS ON AUTOMATION SCIENCE AND ENGINEERING
Volume 11, Issue 2, Pages 473-484Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/TASE.2013.2280618
Keywords
Advanced process control (APC); manufacturing intelligence; overlay errors; proportional-integral controller; run-to-run (R2R) control; yield enhancement
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Funding
- National Science Council [NSC 100-2628-E-007-017-MY3, NSC 100-2218-E-155-003]
- National Tsing Hua University under Toward World-Class Universities Project [101N2074E1]
- Macronix International Company, Ltd.
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As semiconductor manufacturing reaching nanotechnology, to obtain high resolution and alignment accuracy via minimizing overlay errors within the tolerance is crucial. To address the needs of changing production and process conditions, this study aims to propose a novel dynamically adjusted proportional-integral (DAPI) run-to-run (R2R) controller to adapt equipment parameters to enhance the overlay control performance. This study evaluates the performance of controllers via the variation of each overlay factor and the variation of maximum overlay errors in real settings. To validate the effectiveness of the proposed approach, an empirical study was conducted in a leading semiconductor company in Taiwan and the results showed practical viability of the proposed DAPI controller to reduce overlay errors effectively than conventional exponentially weighted moving average controller used in this company.
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