MOCVD of YBCO and Oxide Buffer Layers on Textured Ni-Alloy Tapes

MOCVD technique was applied for deposition of oxide buffer layers onto magnetic and nonmagnetic Ni-alloy tapes at low oxygen partial pressure. YBCO was produced by MOCVD on CSD- and MOCVD-buffer layers. As a result, 1 mu m thick YBCO layers were obtained with a critical current density of max. 1.5 MA/cm(2), which corresponds to 150 A/cm-width. The new MOCVD setup with of several deposition reactors in a one reel-to-reel line was constructed for the single-pass low-cost production of up to 100 m long and 1 cm wide coated conductors with the tape velocity of 10-20 m/h.