Journal
IEEE PHOTONICS TECHNOLOGY LETTERS
Volume 21, Issue 24, Pages 1894-1896Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LPT.2009.2035096
Keywords
Bragg scattering; gratings; rib waveguides; silicon-on-insulator technology; waveguide filters
Funding
- German Research Foundation (DFG) [FOR653]
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In this letter, we present a wafer level technology based on deep-ultraviolet lithography to fabricate Bragg gratings on silicon-on-insulator rib waveguides. The principle of the used double-patterning technique is presented, as well the influence of the process variation on the device performances. The fabricated Bragg gratings were characterized and compared to analogue structures patterned with electron-beam lithography.
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