Journal
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS
Volume 14, Issue 4, Pages 1064-1073Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JSTQE.2008.922909
Keywords
femtosecond laser lithography; photonic band gap materials; silicon
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This paper describes femtosecond laser lithography of 3-D photonic crystal templates in commercial photoresist SU-8 and replication of these templates with silicon. Using this approach, silicon-based photonic crystals having 3-D square spiral architecture and exhibiting photonic stop gaps near the 2.5-mu m wavelength were fabricated. Possibilities to use a multiple-beam interference technique for two-photon absorption templating of photonic crystals are explored.
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