4.4 Article

Patterned Quantum Dot Molecule Laser Fabricated by Electron Beam Lithography and Wet Chemical Etching

Journal

IEEE JOURNAL OF QUANTUM ELECTRONICS
Volume 46, Issue 12, Pages 1827-1833

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/JQE.2010.2047246

Keywords

Coupled quantum dots; quantum dot laser; quantum dot molecule; quantum dots

Funding

  1. Defense Advanced Research Projects Agency [433 143-874a]
  2. National Science Foundation [08-21 979]
  3. Directorate For Engineering
  4. Div Of Electrical, Commun & Cyber Sys [0821979] Funding Source: National Science Foundation

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We report on the fabrication and characterization of an edge-emitting semiconductor laser with a gain medium consisting of two layers of patterned, self-aligned, vertically coupled quantum dots (QDs) using a wet-etching and regrowth technique. A threshold current density of 300 A/cm(2) is demonstrated at 77 K. The presence of emission from QD excited states in both the spontaneous emission and laser spectra indicates 3-D quantum confinement in QDs fabricated using this technique.

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