Journal
IEEE ELECTRON DEVICE LETTERS
Volume 35, Issue 7, Pages 756-758Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2014.2318754
Keywords
Short-channel; ITZO TFTs; drain induced barrier lowering; parasitic resistance
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Funding
- National Research Foundation of Korea (NRF) - Ministry of Education [NRF-2010-0020210]
- Korea Institute of Energy Technology Evaluation and Planning (KETEP) - Korea Government Ministry of Trade, Industry and Energy [20124010203280]
- National Research Foundation of Korea [2010-0020210] Funding Source: Korea Institute of Science & Technology Information (KISTI), National Science & Technology Information Service (NTIS)
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Effect of short-channel induced instabilities in InSnZnO-based thin-film transistors (TFTs) caused by combination of the drain induced barrier lowering (DIBL) and parasitic resistance is reported. As the active channel length decreased below a critical value of around 8 mu m, the drain-current (2.81 mu A) are abruptly increased and N-shaped behavior of the transconductance are observed due to the formation of additional current path in the channel. The magnitude of subgap density of states is also depended on the channel size. The higher value of parasitic resistance RSD (similar to 42 k Omega) and DIBL coefficient (76.8 mV/V) in short-channel ITZO TFT devices are also discussed.
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