Journal
IEEE ELECTRON DEVICE LETTERS
Volume 34, Issue 2, Pages 181-183Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2012.2233458
Keywords
4H-SiC MOSFET; mobility; counter-doping
Categories
Funding
- U.S. Army Research Laboratory [W911NF-07-2-0046]
- U.S. National Science Foundation [MR-0907385]
- II-VI Foundation Block-Gift Program
- Direct For Mathematical & Physical Scien
- Division Of Materials Research [907385] Funding Source: National Science Foundation
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Low interface trap density and high channel mobility on nonpolar faces of 4H-SiC, such as the (11 (2) over bar0) a-face, are of fundamental importance in the understanding of SiC MOS devices. It is also critical for high-voltage trench power MOSFET development. We report new results on the passivation of the SiO2/a-face 4H-SiC interface using phosphorus, yielding field effect mobility of similar to 125 cm(2)/V . s. We also revisit the conventional NO passivation, for which a mobility of similar to 85 cm(2)/V . s was achieved on the a-face. These results not only establish new levels of mobility in SiC MOSFETS but also lead to further insights into factors currently limiting SiC inversion layer mobility.
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