Journal
IEEE ELECTRON DEVICE LETTERS
Volume 33, Issue 8, Pages 1123-1125Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2012.2198911
Keywords
Atomic-layer-deposited (ALD) Al2O3; AlN/GaN; enhancement-mode (E-mode); metal-oxide-semiconductor high-electron mobility transistor (MOS HEMT)
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Funding
- Research Grants Council [CA07/08.EG02]
- Innovation and Technology Commission of Hong Kong Special Administrative Government (HKSAR) [ITS/523/09]
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High-performance enhancement-mode (E-mode) AlN/GaN metal-oxide-semiconductor heterojunction field-effect transistors (MOSHFETs) on Si substrates have been demonstrated. Record high peak transconductance G(m) of 509 mS/mm and maximum drain current I-d of 860 mA/mm were achieved for E-mode MOSHFETs with a source/drain spacing value L-sd of 0.7 mu m. Low gate leakage current (< 10(-3) mA/mm) and improved ohmic contact resistance (0.153 Omega.mm) were enabled by a combination of Al2O3 gate dielectric and regrown source/drain contacts. Al2O3 also significantly increases the 2DEG density under the channel, which is beneficial for device performance by reducing the access resistance. The on-resistance is as low as 1.63 Omega.mm. The average regrowth interface resistance across the sample was estimated to be 0.056 Omega.mm. The E-mode MOSHFETs exhibit a high I-on/I-off ratio up to 10(6).
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