4.6 Article

20.1% Efficient Silicon Solar Cell With Aluminum Back Surface Field

Journal

IEEE ELECTRON DEVICE LETTERS
Volume 32, Issue 8, Pages 1101-1103

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2011.2157656

Keywords

Al back surface field (BSF); light-induced plating (LIP); screen printing; silicon solar cell

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We present a standard p(+)pn(+) solar cell device exhibiting a full-area aluminum back surface field (BSF) and a conversion efficiency of 20.1%. The front side features a shallow emitter which has been exposed to a short oxidation step and reduces the emitter dark saturation current density j(0e) to 160 fA/cm(2) on a textured surface. The front contact is formed by light-induced nickel and silver plating. Also, devices featuring screen-printed front contacts have been realized that reach a conversion efficiency of 19.8%. PC1D simulations are presented in order to extract the electronic parameters of the BSF. Therefore, external quantum efficiency and reflectance have been determined for modeling the internal quantum efficiency by adapting surface recombination and lifetime of the PC1D-simulated silicon device. As a result, a recombination velocity of S-BSF = 283 cm/s and a dark saturation current density of j(BSF) = 274 fA/cm(2) in the Al BSF are determined. This results in an effective diffusion length L-eff = 1150 mu m.

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