Journal
IEEE ELECTRON DEVICE LETTERS
Volume 31, Issue 12, Pages 1386-1388Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2010.2072901
Keywords
AlGaN/GaN; enhancement-mode (E-mode); fluorine plasma ion implantation; Ku-band
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Funding
- National Natural Science Foundation of China [60890192, 60876009]
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Enhancement-mode (E-mode) AlGaN/GaN hetero-junction field effect transistors (HFETs) with a nominal gate length of 0.35 mu m are fabricated on a SiC substrate by fluorine plasma ion implantation without the use of gate recess. The threshold voltage is measured to be +0.2 V by linear extrapolation from the transfer characteristics. The E-mode device exhibits a saturation drain current density of 735 mA/mm at a gate bias of 4 V, a peak transconductance of 269 mS/mm, a current-gain cutoff frequency (f(T)) of 39 GHz, and a maximum oscillation frequency (f(max)) of 91 GHz. At 18 GHz, the fabricated E-mode device exhibits a maximum output power density of 3.65 W/mm, a linear gain of 11.6 dB, and a peak power-added efficiency of 42%. This is the first report of the large-signal performance of AlGaN/GaN E-mode HFETs in the Ku-band.
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