Journal
IEEE ELECTRON DEVICE LETTERS
Volume 31, Issue 12, Pages 1392-1394Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
DOI: 10.1109/LED.2010.2074178
Keywords
HfO2; high-kappa dielectrics; InGaAs; logic; low power; subthreshold swing (SS); tunneling field-effect transistors (TFETs)
Categories
Funding
- Intel Corporation
- Texas Advanced Research Program
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Vertical In0.7Ga0.3As tunneling field-effect transistors are demonstrated with a high on-current of 50 mu A/mu m (in comparison to reported values) and a minimum subthreshold swing (SS) of 86 mV/dec using atomic-layer-deposited HfO2 gate oxide. The tunneling diodes exhibit the gate-bias-dependent Esaki diode behavior with a negative differential resistance under the forward diode bias at various temperatures, which confirms that the conduction mechanism is, indeed, band-to-band tunneling. The effects of equivalent oxide thickness scaling and various temperatures on the on-current and the SS are also investigated.
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